Measured optical losses of Sc doped AlN waveguides von Friedman, B, Barth, S, Schreiber, T, Bartzsch, H, Bain, J, Piazza, G

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Deposition of rutile TiO2 films by pulsed and high power pulsed magnetron sputtering von Schönberger, W., Bartzsch, H., Schippel, S., Bachmann, T.

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Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering von Bartzsch, H., Glöß, D., Böcher, B., Frach, P., Goedicke, K.

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Reactive pulse magnetron sputtered SiOxNy coatings on polymers von LAU, K, WEBER, J, BARTZSCH, H, FRACH, P

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Roughness and optical losses of rugate coatings von Herffurth, T, Trost, M, Schröder, S, Täschner, K, Bartzsch, H, Frach, P, Duparré, A, Tünnermann, A

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Quantification of Differential Response of Tumour and Normal Cells to Microbeam Radiation in the Absence of FLASH Effects von Steel, Harriet, Brüningk, Sarah C, Box, Carol, Oelfke, Uwe, Bartzsch, Stefan H

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Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings von Lange, S., Bartzsch, H., Frach, P., Goedicke, K.

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Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering von Bartzsch, H, Frach, P, Goedicke, K

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Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering von Bartzsch, H, Lange, S, Frach, P, Goedicke, K

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Electrically insulating Al2O3 and SiO2 films for sensor and photovoltaic applications deposited by reactive pulse magnetron sputtering, hollow cathode arc activated deposition and... von Frach, P., Bartzsch, H., Glöß, D., Fahland, M., Händel, F.

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Modeling the stability of reactive sputtering processes von Bartzsch, H., Frach, P.

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A versatile coating tool for reactive in-line sputtering in different pulse modes von Frach, P, Goedicke, K, Gottfried, C, Bartzsch, H

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Different pulse techniques for stationary reactive sputtering with double ring magnetron von Bartzsch, H., Frach, P., Goedicke, K., Gottfried, Chr

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The double ring magnetron process module —a tool for stationary deposition of metals, insulators and reactive sputtered compounds von Frach, P., Gottfried, Chr, Bartzsch, H., Goedicke, K.

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Ensuring long-term stability of process and film parameters during target lifetime in reactive magnetron sputtering von Bartzsch, H, Frach, P, Goedicke, K, Böcher, B, Gottfried, Chr

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Precision coating on an industrial scale: requirements, technologies, equipment von Schönberger, W., Frach, P., Bartzsch, H., Glöss, D.

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Reactive pulse magnetron sputtered SiO x N y coatings on polymers von Lau, K., Weber, J., Bartzsch, H., Frach, P.

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Electrically insulating Al sub(2)O sub(3) and SiO sub(2) films for sensor and photovoltaic applications deposited by reactive pulse magnetron sputtering, hollow cathode arc activat... von Frach, P, Bartzsch, H, Glosz, D, Fahland, M, Handel, F

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Numerical modelling of charged particle motion in electric and magnetic fields to assist magnetron design von Liebig, J.-S., Frach, P., Bartzsch, H., Schulze, D., Schwanbeck, H.

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Properties of SiO 2 and Al 2O 3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering von Bartzsch, H., Glöß, D., Böcher, B., Frach, P., Goedicke, K.

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