Reactive magnetron sputtering of thin films: present status and trends von Musil, J., Baroch, P., Vlček, J., Nam, K.H., Han, J.G.

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Special type of plasma dielectric barrier discharge reactor for direct ozonization of water and degradation of organic pollution von Baroch, P, Saito, N, Takai, O

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Bipolar pulsed electrical discharge for decomposition of organic compounds in water von Baroch, P., Anita, V., Saito, N., Takai, O.

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Generation of plasmas in water: utilization of a high-frequency, low-voltage bipolar pulse power supply with impedance control von Baroch, P, Potocky, S, Saito, N

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Discharge in dual magnetron sputtering system von Musil, J., Baroch, P.

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Plasma Drift in Dual Magnetron Discharge von Baroch, P., Musil, J.

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Reactive magnetron sputtering of TiOx films von BAROCH, P, MUSIL, J, VLCEK, J, NAM, K. H, HAN, J. G

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Bipolar Pulsed Electrical Discharges in Liquid von Baroch, P., Saito, N.

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Atmospheric plasma-calcination of mesoporous tungsten oxide utilizing plasma dielectric barrier discharge von Baroch, P., Hieda, J., Saito, N., Takai, O.

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Two-Functional Direct Current Sputtered Silver-Containing Titanium Dioxide Thin Films von Musil, J, Louda, M, Cerstvy, R, Baroch, P, Ditta, IB, Steele, A, Foster, HA

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Enhancement of the deposition rate in reactive mid-frequency ac magnetron sputtering of hard and optically transparent ZrO^sub 2^ films von Rezek, J, Vlcek, J, Houška, J, Capek, J, Baroch, P

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Enhancement of the deposition rate in reactive mid-frequency ac magnetron sputtering of hard and optically transparent ZrO 2 films von Rezek, J., Vlček, J., Houška, J., Čapek, J., Baroch, P.

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Enhancement of the deposition rate in reactive mid-frequency ac magnetron sputtering of hard and optically transparent ZrO2 films von Rezek, J., Vlček, J., Houška, J., Čapek, J., Baroch, P.

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In-Ga-Zn-O thin films with tunable optical and electrical properties prepared by high-power impulse magnetron sputtering von Rezek, J., Houška, J., Procházka, M., Haviar, S., Kozák, T., Baroch, P.

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A study on the energy distribution for grid-assisting magnetron sputtering von Jung, Min J., Chung, Yun M., Houska, J., Baroch, P., Vlcek, J., Musil, J., Nam, K.H., Han, Jeon G.

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Two-Functional Direct Current Sputtered Silver-Containing Titanium Dioxide Thin Films von Musil, J, Louda, M, Cerstvy, R, Baroch, P, Ditta, I. B, Steele, A, Foster, H. A

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Generation of plasmas in water: utilization of a high-frequency, low-voltage bipolar pulse power supply with impedance control : PLASMAS WITH LIQUIDS von BAROCH, P, POTOCKY, S, SAITO, N

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Degradation of Bacteria Using Pulse Plasma Discharge in Liquid Medium von Baroch, P., Takeda, T., Oda, M., Saito, N., Takai, O.

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Magnetron with gas injection through hollow cathodes machined in sputtered target von Musil, J, Baroch, P, Poláková, H, Vlček, J, Nam, K.H, Han, J.G

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Reactive magnetron sputtering of TiO films von Baroch, P., Musil, J., Vlcek, J., Nam, K.H., Han, J.G.

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