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  1. 1
    Method and apparatus for determining mask layouts for a spacer-is-dielectric self-aligned double-patterning process

    Method and apparatus for determining mask layouts for a spacer-is-dielectric self-aligned double-patterning process von Ban, Yonchan, Lucas, Kevin D

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  2. 2
    Method and apparatus for determining mask layouts for a spacer-is-dielectric self-aligned double-patterning process

    Method and apparatus for determining mask layouts for a spacer-is-dielectric self-aligned double-patterning process von BAN YONCHAN, LUCAS KEVIN D

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  3. 3
    METHOD AND APPARATUS FOR DETERMINING MASK LAYOUTS FOR A SPACER-IS-DIELECTRIC SELF-ALIGNED DOUBLE-PATTERNING PROCESS

    METHOD AND APPARATUS FOR DETERMINING MASK LAYOUTS FOR A SPACER-IS-DIELECTRIC SELF-ALIGNED DOUBLE-PATTERNING PROCESS von BAN YONCHAN, LUCAS KEVIN D

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