Poly(4-methylstyrene-co-chloromethylstyrene): A negative electron beam resist-synthesis and lithography evaluation von Affrossman, Stanley, Bakshaee, Massoud, Bramley, David, Chow, Fong, Dix, Christopher, Hendy, Paul, Jones, Mervyn, Ledwith, Anthony, Mills, Margaret, Tate, Phillip Miller, Pethrick, Richard A.

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