Performance of vertical gate-all-around nanowire p-MOS transistors determined by boron depletion during oxidation von Rossi, Chiara, Burenkov, Alexander, Pichler, Peter, Bär, Eberhard, Müller, Jonas, Larrieu, Guilhem

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Influence of Inner Skin- and Proximity Effects on Conduction in Litz Wires von Rosskopf, Andreas, Bar, Eberhard, Joffe, Christopher

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Calculation of Power Losses in Litz Wire Systems by Coupling FEM and PEEC Method von Rosskopf, Andreas, Bar, Eberhard, Joffe, Christopher, Bonse, Clemens

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Partial Discharges in Ceramic Substrates - Correlation of Electric Field Strength Simulations with Phase Resolved Partial Discharge Measurements von Bayer, Christoph Friedrich, Waltrich, Uwe, Soueidan, Amal, Baer, Eberhard, Schletz, Andreas

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Secondary ion mass spectrometry quantification of boron distribution in an array of silicon nanowires von Michałowski, Paweł Piotr, Müller, Jonas, Rossi, Chiara, Burenkov, Alexander, Bär, Eberhard, Larrieu, Guilhem, Pichler, Peter

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Hierarchical Simulation of Process Variations and Their Impact on Circuits and Systems: Methodology von Lorenz, Jürgen K., Bar, E., Clees, T., Jancke, R., Salzig, C. P. J., Selberherr, S.

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(Invited) Process Variability for Devices at and Beyond the 7 nm Node von Lorenz, Juergen Klaus, Asenov, Asen, Baer, Eberhard, Barraud, Sylvain, Millar, Campbell, Nedjalkov, Mihail

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Hierarchical Simulation of Process Variations and Their Impact on Circuits and Systems: Results von Lorenz, J. K., Bar, E., Clees, T., Evanschitzky, P., Jancke, R., Kampen, C., Paschen, U., Salzig, C. P. J., Selberherr, S.

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The effect of etching and deposition processes on the width of spacers created during self-aligned double patterning von Baer, Eberhard, Lorenz, Juergen

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A fast development simulation algorithm for discrete resist models von Schnattinger, Thomas, Bär, Eberhard, Erdmann, Andreas

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Process variability for devices at and beyond the 7 nm node von Lorenz, Juergen, Asenov, Asen, Baer, Eberhard, Barraud, Sylvain, Kluepfel, Fabian, Millar, Campbell, Nedjalkov, Mihail

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Correlation-aware analysis of the impact of process variations on circuit behavior: Presentation held at SISPAD 2012, International Conference on Simulation of Semiconductor Proces... von Burenkov, Alex, Baer, Eberhard, Lorenz, Juergen, Kampen, Christian

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Process for peparing homo-and copolymers of vinyl chloride by aqueous emulsion batch polymerization von ROBERT HOHENADEL, RUDOLF PUHE, EBERHARD BAER

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Process for preparing homo- and copolymers of vinyl chloride von ROBERT HOHENADEL, RUDOLF PUHE, EBERHARD BAER

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PVC polymerization with metered addition of emulsifiers von LUX ALFRED, PUHE RUDOLF, BAER EBERHARD, HOHENADEL ROBERT

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Production of (co)polyvinyl chloride useful for making plastisol by batch emulsion polymerization von BAER, EBERHARD., 84489 BURGHAUSEN, DE, LUX, ALFRED, 84508 BURGKIRCHEN, DE, HOHENADEL, ROBERT., 84543 WINHOERING, DE, PUHE, RUDOLF., 84489 BURGHAUSEN, DE

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Processo para preparação de homopolìmeros e polìmeros mistos do cloreto de vinila von ROBERT HOHENADEL, RUDOLF PUHE, EBERHARD BAER, ALFRED LUX

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Process for producing homopolymers and copolymers of vinyl chloride von PUHE, RUDOLF DR, BAER, EBERHARD DR, HOHENADEL, ROBERT DR, LUX, ALFRED

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Process for producing homopolymers and copolymers of vinyl chloride von PUHE, RUDOLF DR, BAER, EBERHARD DR, HOHENADEL, ROBERT DR, LUX, ALFRED

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ANORDNUNG ZUR UEBERWACHUNG DES SCHUETTPROFILS VON MASSENSCHUETTGUETERN BEI DER VERLADUNG IN GUETERWAGEN von BRAUER,HANS,DD, BAER,EBERHARD,DD, SCHERER,PETER,DD

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