Analysis and application of a viscoelastic model for silicon oxidation von Senez, Vincent, Collard, Dominique, Baccus, Bruno, Brault, Mathieu, Lebailly, Jacques

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Modeling high-concentration boron diffusion under amorphization conditions von Baccus, Bruno, Vandenbossche, Eric, Lannoo, Michel

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Modelling inactive boron during predeposition processes von VANDENBOSSCHE, E, BACCUS, B

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Two-dimensional simulation of local oxidation of silicon: calibrated viscoelastic flow analysis von Senez, V., Collard, D., Ferreira, P., Baccus, B.

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Impact of low-temperature transient-enhanced diffusion of dopants in silicon von Baccus, Bruno

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Mechanical stress analysis of an LDD MOSFET structure von Ferreira, P., Senez, V., Baccus, B.

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Transient Diffusion Phenomena due to Ion Implantation Damage von Baccus, Bruno, Vandenbossche, Eric

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Interactions between dopants and point defects during nitridation processes von VANDENBOSSCHE, E, BACCUS, B

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A continuous and general model for boron diffusion during post-implant annealing including damaged and amorphizing conditions von Baccus, B., Vandenbossche, E.

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A study of nonequilibrium diffusion modeling-applications to rapid thermal annealing and advanced bipolar technologies von Baccus, B., Wada, T., Shigyo, N., Norishima, M., Nakajima, H., Inou, K., Iinuma, T., Iwai, H.

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Adaptive mesh refinement for multilayer process simulation using the finite element method von Baccus, B., Collard, D., Dubois, E.

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Efficient two-dimensional multilayer process simulation of advanced bipolar devices von Baccus, Bruno, Dubois, Emmanuel, Collard, Dominique, Morel, Denis

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A study of the electrical performances of isolation structures von Dubois, E., Coppee, J.-L., Baccus, B., Collard, D.

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Analysis of the Punchthrough Effect in Walled Emitter Bipolar Transistors von Dubois, Emmanuel, Baccus, Bruno, Collard, Dominique

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Modelling high concentration boron diffusion with dynamic clustering: influence of the initial conditions von Baccus, Bruno, Vandenbossche, Eric

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A continuous and general model for boron diffusion during post-implant annealing including damaged and amorphizing conditions von Baccus, B., Vandenbossche, E.

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3-dimensional simulation of thermal diffusion and oxidation processes von Senez, V., Bozek, S., Baccus, B.

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Modeling arsenic activation and diffusion during furnace and rapid thermal annealing von Vandenbossche, E., Jaouen, H., Baccus, B.

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Simulation of advanced field isolation using calibrated viscoelastic stress analysis von Senez, V., Collard, D., Ferreira, P., Baccus, B.

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DICHTUNGSBAHN von SANIAL, PHILIPPE, BACCUS, GERARD, CLEDAT, BRUNO

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