Treffer 1 - 8 von 8 für Suche 'BROEKE DOUGLAS V.D', Suchdauer: 0,58s Treffer weiter einschränken
  1. 1
    Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography

    Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography von BROEKE DOUGLAS V.D, CHEN JANG F

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  2. 2
    Optical proximity correction method utilizing phase-edges as sub-resolution assist features

    Optical proximity correction method utilizing phase-edges as sub-resolution assist features von BROEKE DOUGLAS V.D, CHEN J. F

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  3. 3
    CPL mask and a method and program product for generating the same

    CPL mask and a method and program product for generating the same von BROEKE DOUGLAS V.D, WAMPLER KURT E, CHEN JANG F

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  4. 4
    Eigen decomposition based OPC model

    Eigen decomposition based OPC model von BROEKE DOUGLAS V.D, SHI XUELONG, SOCHA ROBERT J, LAIDIG THOMAS

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  5. 5
    Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography

    Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography von BROEKE DOUGLAS V.D, WAMPLER KURT E, LAIDIG THOMAS, CHEN JANG F, HSU STEPHEN D

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  6. 6
    Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM

    Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM von BROEKE DOUGLAS V.D, LAIDIG THOMAS, CHEN JANG F, HSU MICHAEL, HSU STEPHEN

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  7. 7
    Feature optimization using interference mapping lithography

    Feature optimization using interference mapping lithography von BROEKE DOUGLAS V.D, SHI XUELONG, SOCHA ROBERT J, CHEN JANG F

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  8. 8
    Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography

    Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography von BROEKE DOUGLAS V.D, SHI XUELONG, WAMPLER KURT E, LAIDIG THOMAS, CHEN JANG F

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