Influence of anode roughness and buffer layer nature on organic solar cells performance von Dahou, F.Z., Cattin, L., Garnier, J., Ouerfelli, J., Morsli, M., Louarn, G., Bouteville, A., Khellil, A., Bernède, J.C.

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Modelling of an infrared halogen lamp in a rapid thermal system von Logerais, P.O., Bouteville, A.

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NUMERICAL SIMULATION APPLIED TO CHEMICAL VAPOUR DEPOSITION PROCESS. RAPID THERMAL CVD AND SPRAY CVD von Bouteville, A

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Towards anode with low indium content as effective anode in organic solar cells von Touihri, S., Cattin, L., Nguyen, D-T., Morsli, M., Louarn, G., Bouteville, A., V.Froger, Bernède, J.C.

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Residual stress gradient analysis by the GIXRD method on CVD tantalum thin films von Peng, J., Ji, V., Seiler, W., Tomescu, A., Levesque, A., Bouteville, A.

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Patients treated with vitamin K oral anticoagulants in family practice: a new approach to bleeding risk assessment. An ancillary study by the CACAO prospective general practice coh... von Gaboreau, Yoann, Frappé, Paul, Vermorel, Celine, Foote, Alison, Bosson, Jean-Luc, Pernod, Gilles

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Validation of a Rapid Thermal Processing model in steady-state von Logerais, P.O., Chapron, D., Garnier, J., Bouteville, A.

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Oral anticoagulant safety in family practice: prognostic accuracy of Bleeding Risk Scores (from the CACAO study) von Gaboreau, Yoann, Frappé, Paul, Vermorel, Céline, Foote, Alison, Bosson, Jean-Luc, Pernod, Gilles

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Droplet dispersion calculations for ultrasonic spray pyrolysis depositions von Chapron, D, Girtan, M, Le Pommelec, J-Y, Bouteville, A

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Preparation and properties of SnO2:F thin films von Girtan, M, Boutevllle, A, Rusu, G G, Rusu, M

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Influence of the quartz window in a rapid thermal processing apparatus von Logerais, P O, Girtan, M, Bouteville, A

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Substrate thermal profiles in spray-CVD reactor von Girtan, M, Logerais, P O, Bouteville, A

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Kinetics of the formation of titanium nitride layers by rapid thermal low pressure chemical vapor deposition from TiCl4-NH3-H2 von IMHOFF, L, BOUTEVILLE, A, REMY, J. C

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Micro-scratch test study of TiN films grown on silicon by chemical vapor deposition von Benayoun, S, Hantzpergue, J.J, Bouteville, A

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THERMAL PROFILE EVALUATION OF A SILICON WAFER IN THE APPARATUS FOR RAPID THERMAL CHEMICAL VAPOUR DEPOSITION von Girtan, M, Logerais, P O, Avril, L, Gonzzatti, F, Bouteville, A

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Thermodynamics of the formation of TiN from TiCl4-NH3-H2 on a patterned oxidized silicon substrate von BOUTEVILLE, A, IMHOFF, L, REMY, J. C

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Optimization of Titanium Nitride Rapid Thermal CVD Process von de Baynast, H., Bouteville, A., Remy, J.-C.

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Thermodynamics of the Formation of TiN from TiCl4 ‐  NH 3 ‐  H 2 on a Patterned Oxidized Silicon Substrate von Bouteville, A., Imhoff, L., Remy, J. C.

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Composition and tribological characterization of chemically vapour-deposited TiN layer von Fouilland, L., Imhoff, L., Bouteville, A., Benayoun, S., Remy, J.C., Perrière, J., Morcrette, M.

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Fabrication and Properties of Tantalum Film Deposited on Titanium through LP‐CVD from TaCl 5 ‐H 2 von Levesque, A., Bouteville, A.

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