Investigating the Health of a Rice Field Ecosystem Using Thermodynamic Extremal Principles von Mondal, Ayan, Das, Nilanjan, Banerjee, Rituparna, Batabyal, Sunanda, Gangopadhyay, Sohini, Ray, Harisankar, Biswas, Nivedita, Mandal, Sudipto

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The Role of Rare Earth Metals on Effective Work Function Modulation of Nickel Fully-Silicided Gate/High-k Dielectric Stacks for n-Channel Metal Oxide Semiconductor Device Applicati... von Lee, Bongmook, Novak, Steven R., Biswas, Nivedita, Misra, Veena

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Effector T cell stimulation using Staphylococcal enterotoxin G and I loaded HLA transgenic dendritic cells von Knopick, Peter Leo, Riha, Nathan, Biswas, Nivedita, Nilles, Matthew, Bradley, David S

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Evaluation of nickel and molybdenum silicides for dual gate complementary metal-oxide semiconductor application von Biswas, Nivedita, Gurganus, Jason, Misra, Veena, Yang, Yan, Stemmer, Susanne

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Humanized HLA-DQ8αβ transgenic mice treated with SEG/SEI superantigens exhibit long-term CD4+-mediated anti-tumor responses von Knopick, Peter Leo, Alvine, Travis D, Biswas, Nivedita, Nilles, Matthew L, Terman, David S, Bradley, David S

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Electrical characteristics of metal-oxide-semiconductor capacitors on p -GaAs using atomic layer deposition of ultrathin HfAlO gate dielectric von Suri, Rahul, Lee, Bongmook, Lichtenwalner, Daniel J., Biswas, Nivedita, Misra, Veena

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Atomic Layer Deposition of Hafnium Dioxide on TiN and Self-Assembled Monolayer Molecular Film von Chen, Zhong, Sarkar, Smita, Biswas, Nivedita, Misra, Veena

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Work function tuning of nickel silicide by co-sputtering nickel and silicon von Biswas, Nivedita, Gurganus, Jason, Misra, Veena

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The Role of Rare Earth Metals on Effective Work Function Modulation of Nickel Fully-Silicided Gate/High- k Dielectric Stacks for n-Channel Metal Oxide Semiconductor Device Applicat... von Lee, Bongmook, Novak, Steven R., Biswas, Nivedita, Misra, Veena

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Work function extraction of metal gates with alternate channel materials von Coan, Mary, Johnson, Derek, Hwan Woo, Jung, Biswas, Nivedita, Misra, Veena, Majhi, Prashant, Rusty Harris, H.

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Electrical and Physical Analysis of MoTa Alloy for Gate Electrode Applications von Chen, Bei, Biswas, Nivedita, Misra, Veena

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Characteristics of Ni/Gd FUSI for NMOS Gate Electrode Applications von Bongmook Lee, Biswas, N., Novak, S.R., Misra, V.

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On the Issue of Work Function Tuning of Nickel Silicide Gates von Biswas, Nivedita, Lee, Bongmook, Misra, Veena

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Influence of oxygen diffusion through capping layers of low work function metal gate electrodes von Bei Chen, Jha, R., Lazar, H., Biswas, N., Jaehoon Lee, Bongmook Lee, Wielunski, L., Garfunkel, E., Misra, V.

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Workfunction Tuning of Nickel Silicide by Varying Nickel and Silicon Composition von Biswas, Nivedita, Novak, Steven, Lee, Bongmook, Chen, Bei, Misra, Veena

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Enhanced Dielectric Constant of HfO2 and Al2O3 Thin-Films with Silver Nanoparticles von Ravindran, Ramasamy, Othman, Maslina, Yun, Minseong, Biswas, Nivedita, Mehta, Narendra, Guha, Suchi, Gangopadhyay, Keshab, Gangopadhyay, Shubhra

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On the Issue of Work Function Tuning of Nickel Silicide Gates von Biswas, Nivedita, Lee, Bongmook, Misra, Veena

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Workfunction Tuning of Nickel Silicide by Varying Nickel and Silicon Composition von Biswas, Nivedita, Novak, Steven, Misra, Veena

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Enhanced Dielectric Constant of HfO2 and Al2O3 Thin-Films with Silver Nanoparticles von Ravindran, Ramasamy, Othman, Maslina, Yun, Minseong, Biswas, Nivedita, Mehta, Narendra, Guha, Suchi, Gangopadhyays, Keshab, Gangopadhyay, Shubhra

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Evaluation of fermi level pinning in low, midgap and high workfunction metal gate electrodes on ALD and MOCVD HfO2 under high temperature exposure von JHA, Rashmi, LEE, Jaehoon, BEI CHEN, LAZAR, Heather, GURGANUS, Jason, BISWAS, Nivedita, MAJHI, Prashant, BROWN, George, MISRA, Veena

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