Fast deposition of diamond-like hydrogenated carbon films von Zaharia, T., Sullivan, J.L., Saied, S.O., Bosch, R.C.M., Bijker, M.D.

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Chromium oxide coatings applied to magnetic tape heads for improved wear resistance von Sourty, E., Sullivan, J.L., Bijker, M.D.

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The development of a thin Cr2O3 wear protective coating for the advanced digital recording system von BIJKER, M. D, BASTIAENS, J. J. J, DRAAISMA, E. A, DE JONG, L. A. M, SOURTY, E, SAIED, S. O, SULLIVAN, J. L

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Textured silicon surface passivation by high-rate expanding thermal plasma deposited SiN and thermal SiO2/SiN stacks for crystalline silicon solar cells von van Erven, A. J. M., Bosch, R. C. M., Bijker, M. D.

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Oblique sputtered Co and Co80Ni20 thin films von BIJKER, M.D., VISSER, E.M., LODDER, J.C., POPMA, TH.J.A.

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Radiative wafer heating during plasma deposition process von Bosch, R. C. M., Kant, C. H., van Erven, A. J. M., Stals, W. T. M., Bijker, M. D.

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Numerical modelling of sub-surface stress in magnetic data tape heads due to the dynamic contact with a tape von Sourty, E., Sullivan, J.L., Bijker, M.D.

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The tribology of advanced digital recording (ADR) systems von Sourty, E, Sullivan, J.L, Bijker, M.D

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Thermal domain stability of advanced digital recording (ADR) thin film heads von Bijker, M.D., Draaisma, E.A., Eisenberg, M., Toonen, L.

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Future directions in advanced digital recording technology von Bijker, M.D, Draaisma, E.A, Eisenberg, M, Jansen, J, Persat, N, Sourty, E

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The development of a thin Cr 2O 3 wear protective coating for the advanced digital recording system von Bijker, M.D., Bastiaens, J.J.J., Draaisma, E.A., de Jong, L.A.M., Sourty, E., Saied, S.O., Sullivan, J.L.

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Optimisation of obliquely sputter deposited media von Bijker, M.D., Visser, E.M., Lodder, J.C., Popma, Th.J.A.

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Good Surface Passivation of C-SI by High Rate Plasma Deposited Silicon Oxide von Hoex, B., Peeters, F.J.J., Creatore, M., Bijker, M.D., Kessels, W.M.M.

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The role of oxygen in obliquely deposited tapes von Bijker, M.D., Abelmann, L., Lodder, J.C., Popma, Th.J.A.

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Ultra high-rate ETP deposited silicon nitride for >15% in-line processed multicrystalline silicon solar cells von van Erven, A.J.M., Bosch, R.C.M., Toelle, R., Voight, O., Petri, S., Bijker, M.D.

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Oblique metal deposited thin films for magnetic recording von Bijker, M.D., Visser, E.M., Lodder, J.C.

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Infrared Heating with Opaque Quartz Reflector Technology von Kant, C.H., van Erven, A.J.M., Bosch, R.C.M., Stals, W.T.M., Bijker, M.D.

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High-Quality Surface Passivation Obtained by High-Rate Deposited Silicon Nitride, Silicon Dioxide and Amorphous Silicon using the Versatile Expanding Thermal Plasma Technique von Hoex, B., Peeters, F.J.J., van Erven, A.J.M., Bijker, M.D., Kessels, W.M.M., van de Sanden, M.C.M.

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Interaction in double layered ME tapes von Immink, A.H.J., Bijker, M.D., Abelmann, L., Lodder, J.C.

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Plasma properties of a novel commercial plasma source for high-throughput processing of c-Si solar cells von van den Oever, P.J., Kessels, W.M.M., Hoex, B., Bosch, R.C.M., van Erven, A.J.M., Pennings, R.L.J.R., Stals, W.T.M., Bijker, M.D., van de Sanden, M.C.M.

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