Dry etching in the presence of physisorption of neutrals at lower temperatures von Lill, Thorsten, Berry, Ivan L., Shen, Meihua, Hoang, John, Fischer, Andreas, Panagopoulos, Theo, Chang, Jane P., Vahedi, Vahid

Volltext

Predicting synergy in atomic layer etching von Kanarik, Keren J., Tan, Samantha, Yang, Wenbing, Kim, Taeseung, Lill, Thorsten, Kabansky, Alexander, Hudson, Eric A., Ohba, Tomihito, Nojiri, Kazuo, Yu, Jengyi, Wise, Rich, Berry, Ivan L., Pan, Yang, Marks, Jeffrey, Gottscho, Richard A.

Volltext

Universal scaling relationship for atomic layer etching von Kanarik, Keren J., Tan, Samantha, Yang, Wenbing, Berry, Ivan L., Pan, Yang, Gottscho, Richard A.

Volltext

Applying sputtering theory to directional atomic layer etching von Berry, Ivan L., Kanarik, Keren J., Lill, Thorsten, Tan, Samantha, Vahedi, Vahid, Gottscho, Richard A.

Volltext

Ion Beam Patterning of High-Density STT-RAM Devices von Ip, Vincent, Shuogang Huang, Carnevale, Santino D., Berry, Ivan L., Rook, Katrina, Lill, Thorsten B., Paranjpe, Ajit P., Cerio, Frank

Volltext

Erratum: “Universal scaling relationship for atomic layer etching” [J. Vac. Sci. Technol. A 39, 010401 (2021)] von Kanarik, Keren J., Tan, Samantha, Yang, Wenbing, Berry, Ivan L., Pan, Yang, Gottscho, Richard A.

Volltext

Evaluation of Plasma Strip Induced Substrate Damage von Luo, S., Berry, Ivan L., Waldfried, Carlo, Escorcia, O., Han, Ke Ping

Volltext

Photoresist strip effects on dopant distribution, activation and junction recess von Berry, Ivan L.

Volltext

Cooling Broiler Chickens by Surface Wetting: Indoor Thermal Environment, Water Usage,and Bird Performance von Liang, Y, Tabler, G T, Costello, T A, Berry, I L, Watkins, S E, Thaxton, Y V

Volltext

Energy Use Analysis of Open-Curtain vs. Totally Enclosed Broiler Houses in Northwest Arkansas von Liang, Y, Tabler, G.T, Watkins, S.E, Xin, H, Berry, I.L

Volltext

I: Ultra-Shallow Junction Cleaning: Metrology for Evaluating Dopant Loss and Substrate Erosion von Srivastava, Aseem K., Berry, Ivan L., Ameen, Mike

Volltext

ION INJECTOR ELECTRODE ASSEMBLY FOR ION BEAM ETCHING von BERRY IVAN L, LILL THORSTEN

Volltext bestellen

Post Extension Ion Implant Photo Resist Strip for 32 nm Technology and beyond von Luo, S., Mannaert, G., Shamiryan, Denis, Berry, Ivan L., Han, K., Falepin, A., Boullart, Werner, Sonnemans, R., Waldfried, Carlo, Witters, L.

Volltext

ION BEAM ETCHING WITH SIDEWALL CLEANING von LILL, Thorsten, BERRY, III, Ivan L

Volltext bestellen

Ion beam etching with sidewall cleaning von Lill, Thorsten, Berry, III, Ivan L

Volltext bestellen

II: Ultra-Shallow Junction Cleaning: Methodologies for Process and Chemistry Optimization von Srivastava, Aseem K., Berry, Ivan L., Han, Ke Ping, Rounds, Stu, Ameen, Mike

Volltext

Activated He:H2 Strip of Photoresist over Porous Low-k Materials von Han, Qing Yuan, White, Brian, Berry, Ivan L., Waldfried, Carlo, Escorcia, O.

Volltext

ION BEAM ETCHING WITH SIDEWALL CLEANING von Lill, Thorsten, Berry, III, Ivan L

Volltext bestellen

Fluid distribution members and/or assemblies von BERRY IVAN L, HUSEINOVIC ARMIN

Volltext bestellen

ELECTRON EXCITATION ATOMIC LAYER ETCH von Lill, Thorsten, Fischer, Andreas, Berry, III, Ivan L

Volltext bestellen