The Mn+1AXn phases: Materials science and thin-film processing von EKLUND, Per, BECKERS, Manfred, JANSSON, Ulf, HÖGBERG, Hans, HULTMAN, Lars

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The M+1AX phases: Materials science and thin-film processing von Eklund, Per, Beckers, Manfred, Jansson, Ulf, Högberg, Hans, Hultman, Lars

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Physical properties of thin GeO2 films produced by reactive DC magnetron sputtering von LANGE, T, NJOROGE, W, WEIS, H, BECKERS, M, WUTTIG, M

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The location and effects of Si in (Ti 1– x Si x )N y thin films von Flink, Axel, Beckers, Manfred, Sjölén, Jacob, Larsson, Tommy, Braun, Slawomir, Karlsson, Lennart, Hultman, Lars

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Effects of volume mismatch and electronic structure on the decomposition of ScAlN and TiAlN solid solutions von Höglund, Carina, Alling, Björn, Birch, Jens, Beckers, Manfred, Persson, Per O. Å., Baehtz, Carsten, Czigány, Zsolt, Jensen, Jens, Hultman, Lars

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Effects of strain and composition on the lattice parameters and applicability of Vegard's rule in Al-rich Al1-x Inx N films grown on sapphire von Darakchieva, Vanya, Beckers, Manfred, Xie, Mengyao, Hultman, Lars, Monemar, Bo, Carlin, J-. F., Feltin, E., Gonschorek, M., Grandjean, N.

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High-rate deposition of amorphous and nanocomposite Ti–Si–C multifunctional coatings von Lauridsen, J., Eklund, P., Joelsson, T., Ljungcrantz, H., Öberg, Å., Lewin, E., Jansson, U., Beckers, M., Högberg, H., Hultman, L.

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Phase stability of epitaxially grown Ti2AlN thin films von Beckers, M., Schell, N., Martins, R. M. S., Mücklich, A., Möller, W.

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The M n + 1 AX n phases: Materials science and thin-film processing von Eklund, Per, Beckers, Manfred, Jansson, Ulf, Högberg, Hans, Hultman, Lars

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The M(n+1)AX(n) phases: Materials science and thin-film processing von Eklund, Per, Beckers, Manfred, Jansson, Ulf, Högberg, Hans, Hultman, Lars

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Growth and characterization of TiN/SiN(001) superlattice films von Söderberg, Hans, Odén, Magnus, Flink, Axel, Birch, Jens, Persson, Per O.Å., Beckers, Manfred, Hultman, Lars

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Freestanding AlN single crystals enabled by self-organization of 2H-SiC pyramids on 4H-SiC substrates von Yazdi, G. R., Beckers, M., Giuliani, F., Syväjärvi, M., Hultman, L., Yakimova, R.

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Microstructure and nonbasal-plane growth of epitaxial Ti2AlN thin films von Beckers, M., Schell, N., Martins, R. M. S., Mücklich, A., Möller, W., Hultman, L.

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Sputter deposition from a Ti 2 AlC target: Process characterization and conditions for growth of Ti 2 AlC von Frodelius, Jenny, Eklund, Per, Beckers, Manfred, Persson, Per, Högberg, Hans, Hultman, Lars

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Epitaxial growth of Al–Cr–N thin films on MgO(111) von Willmann, H., Beckers, M., Birch, J., Mayrhofer, P.H., Mitterer, C., Hultman, L.

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The influence of substrate temperature and Al mobility on the microstructural evolution of magnetron sputtered ternary Ti-Al-N thin films von Beckers, M., Höglund, C., Baehtz, C., Martins, R. M. S., Persson, P. O. Å., Hultman, L., Möller, W.

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The location and effects of Si in (Ti1–xSix)Ny thin films von Flink, Axel, Beckers, Manfred, Sjölén, Jacob, Larsson, Tommy, Braun, Slawomir, Karlsson, Lennart, Hultman, Lars

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The location and effects of Si in (Ti(1-x)Si(x)N(Y)thin films von Flink, Axel, Beckers, Manfred, Sjolen, Jacob, Larsson, Tommy, Braun, Slawomir, Karlsson, Lennart, Hultman, Lars

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Effects of O and N impurities on the nanostructural evolution during growth of Cr/Sc multilayers von Ghafoor, Naureen, Eriksson, Fredrik, Mikhaylushkin, Arkady S., Abrikosov, Igor A., Gullikson, Eric. M., Kressig, Ulrich, Beckers, Manfred, Hultman, Lars, Birch, Jens

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Magnetron sputtering of Ti3SiC2 thin films from a Ti3SiC2 compound target von Eklund, Per, Beckers, Manfred, Frodelius, Jenny, Högberg, Hans, Hultman, Lars

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