Modeling of Capillary Pattern Collapse on Sub-5nm Pillars Using Molecular Dynamics von Rotondaro, Antonio, Bassett, Derek W., Aryal, Dipak

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Drying Stability and Critical Height of Repeating Line/Space Structures von Bassett, Derek W.

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Solid Phase Clean: Improving Performance for Smaller Particle Removal without Pattern Damage and Film Loss von Aibara, Meitoku, Sekiguchi, Kenji, Kaneko, Miyako, Bassett, Derek, Kanno, Itaru

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Modeling and Optimization of Wet ALE Process von Bassett, Derek, Abel, Kate

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Silica Formation during Etching of Silicon Nitride in Phosphoric Acid von Rotondaro, Antonio L.P., Bassett, Derek W.

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(Invited) Capillary Pattern Collapse: Prediction and Prevention from Past to Future von Bassett, Derek W

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Advanced Cryogenic Aerosol Cleaning: Small Particle Removal and Damage-Free Performance von Bassett, Derek W., Printz, Wallace P., Butterbaugh, Jeffery W., Thomes, Gregory P., Mbanaso, Chimaobi, Schwab, Brent D., Rathman, Christina Ann, Rotondaro, Antonio L.P., Becker, David Scott, Lauerhaas, Jeffrey M.

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Investigating the Role of Fluid Dynamics on Cut Width Accuracy in Wet Bevel Cleaning Techniques von Dong, Rencheng, Fujita, Akira, Bassett, Derek, Shinohara, Kazuyoshi, Takahashi, Shuhei, Simms, Ihsan

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Ultimate Limits of Pattern Stability Due to Thermal Vibrations von Bassett, Derek, Rotondaro, Antonio

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Etching of Silicon Nitride in 3D NAND Structures von Bassett, Derek, Printz, Wallace, Furukawa, Takahiro

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(Invited) Wet Etching inside Advanced High Aspect Ratio Structures: Impact of Dissolved Oxygen von Sakazaki, Tetsuya, Kosugi, Hitoshi, Bassett, Derek W, Simms, Ihsan, Rotondaro, Antonio, Hurd, Trace

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(Invited) Capillary Pattern Collapse: Prediction and Prevention from Past to Future von Bassett, Derek W

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Ultimate Limits of Pattern Stability Due to Thermal Vibrations von Bassett, Derek, Rotondaro, Antonio

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PLASMA PROCESSING METHOD AND APPARATUS von VAN ELSEN, Lance, LAUERHAAS, Jeffrey, BASSETT, Derek William

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PLASMA PROCESSING METHOD AND APPARATUS von Lauerhaas, Jeffrey, Bassett, Derek William, Van Elsen, Lance

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Rapid Wafer Drying Using Induction Heating von Rotondaro, Antonio, Bassett, Derek

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Efficient large scale stereoinversion of ( R)-ethyl 3-hydroxybutyrate von Carnell, Andrew J., Head, Robert, Bassett, Derek, Schneider, Michael

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System and methods for wafer drying von Hurd, Trace, Rotondaro, Antonio Luis Pacheco, Bassett, Derek William, Kosugi, Hitoshi

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(Invited) Wet Etching inside Advanced High Aspect Ratio Structures: Impact of Dissolved Oxygen von Sakazaki, Tetsuya, Kosugi, Hitoshi, Bassett, Derek W, Simms, Ihsan, Rotondaro, Antonio, Hurd, Trace

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SYSTEM AND METHODS FOR WAFER DRYING von ROTONDARO, Antonio, KOSUGI, Hitoshi, BASSETT, Derek, HURD, Trace

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