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Effect of substrates and underlayer on CNT synthesis by plasma enhanced CVD
Veröffentlicht in Advances in manufacturing
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Simulations of radical and ion fluxes on a wafer in a Cl 2 / Ar inductively coupled plasma discharge: Confrontation with GaAs and GaN etch experiments
Veröffentlicht in Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
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