Disorder-induced inhomogeneities of the superconducting state close to the superconductor-insulator transition von Sacépé, B, Chapelier, C, Baturina, T I, Vinokur, V M, Baklanov, M R, Sanquer, M

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Evaluation of Mechanical Properties of Porous OSG Films by PFQNM AFM and Benchmarking with Traditional Instrumentation von Ovchinnikov, I. S, Vishnevskiy, A. S, Seregin, D. S, Rezvanov, A. A, Schneider, D, Sigov, A. S, Vorotilov, K. A, Baklanov, M. R

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Localized superconductivity in the quantum-critical region of the disorder-driven superconductor-insulator transition in TiN thin films von Baturina, T I, Mironov, A Yu, Vinokur, V M, Baklanov, M R, Strunk, C

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Intrinsic effect of porosity on mechanical and fracture properties of nanoporous ultralow- k dielectrics von Vanstreels, K., Wu, C., Verdonck, P., Baklanov, M. R.

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Damage free integration of ultralow-k dielectrics by template replacement approach von Zhang, L., de Marneffe, J.-F., Heylen, N., Murdoch, G., Tokei, Z., Boemmels, J., De Gendt, S., Baklanov, M. R.

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Effect of the C-bridge length on the ultraviolet-resistance of oxycarbosilane low-k films von Redzheb, M., Prager, L., Naumov, S., Krishtab, M., Armini, S., Van Der Voort, P., Baklanov, M. R.

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Non-destructive characterisation of porous low-k dielectric films von Baklanov, M.R., Mogilnikov, K.P.

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Effect of pressure on efficiency of UV curing of CVD-derived low- k material at different wavelengths von Prager, L., Marsik, P., Wennrich, L., Baklanov, M.R., Naumov, S., Pistol, L., Schneider, D., Gerlach, J.W., Verdonck, P., Buchmeiser, M.R.

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Challenges in the implementation of low-k dielectrics in the back-end of line von Hoofman, R.J.O.M., Verheijden, G.J.A.M., Michelon, J., Iacopi, F., Travaly, Y., Baklanov, M.R., Tökei, Zs, Beyer, G.P.

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Impact of wavelength of UV light and UV cure time on chemical and mechanical properties of PECVD deposited porous ultra low-k films von Godavarthi, S., Le, Q.T., Verdonck, P., Mardani, S., Vanstreels, K., Van Besien, E., Baklanov, M.R.

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Chemisorption of ALD precursors in and on porous low-k films von Verdonck, P., Delabie, A., Swerts, J., Farrell, L., Baklanov, M.R., Tielens, H., Van Besien, E., Witters, T., Nyns, L., Van Elshocht, S.

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Charge Transport Mechanism in a PECVD Deposited Low-k SiOCH Dielectric von Perevalov, T. V., Gismatulin, A. A., Gritsenko, V. A., Xu, H., Zhang, J., Vorotilov, K. A., Baklanov, M. R.

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Porosity in plasma enhanced chemical vapor deposited SiCOH dielectrics: A comparative study von Grill, A., Patel, V., Rodbell, K. P., Huang, E., Baklanov, M. R., Mogilnikov, K. P., Toney, M., Kim, H.-C.

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Integrated diffusion–recombination model for describing the logarithmic time dependence of plasma damage in porous low- k materials von Kunnen, E., Barkema, G.T., Maes, C., Shamiryan, D., Urbanowicz, A., Struyf, H., Baklanov, M.R.

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Effect of H atoms and UV wideband radiation on cured low-k OSG films von Lopaev, D V, Zotovich, A I, Zyryanov, S M, Bogdanova, M A, Rakhimova, T V, Mankelevich, Y A, Novikova, N N, Seregin, D S, Vishnevskiy, A S, Vorotilov, K A, Shi, Xiaoping, Baklanov, M R

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Silicon dioxide and low-k material sputtering in dual frequency inductive discharge by argon ions with energies from 16 to 200 eV von Lopaev, D V, Rakhimova, T V, Rakhimov, A T, Zotovich, A I, Zyryanov, S M, Baklanov, M R

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Effect of water content on the structural properties of porous methyl-modified silicate films von Vishnevskiy, A. S., Seregin, D. S., Vorotilov, K. A., Sigov, A. S., Mogilnikov, K. P., Baklanov, M. R.

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Stiffening and hydrophilisation of SOG low-k material studied by ellipsometric porosimetry, UV ellipsometry and laser-induced surface acoustic waves von Urbanowicz, A. M., Meshman, B., Schneider, D., Baklanov, M. R.

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Improving mechanical robustness of ultralow- k SiOCH plasma enhanced chemical vapor deposition glasses by controlled porogen decomposition prior to UV-hardening von Urbanowicz, A. M., Vanstreels, K., Verdonck, P., Shamiryan, D., De Gendt, S., Baklanov, M. R.

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Damage and etching of ultra low-k materials in fluorocarbon plasma at lowered temperatures von Lopaev, D V, Mankelevich, Yu A, Rakhimova, T V, Zotovich, A I, Zyryanov, S M, Baklanov, M R

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