Estimation of the pressure-distance product for thermalization in sputtering for some selected metal atoms by Monte Carlo simulation von Nakano, Takeo, Baba, Shigeru

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Effects of target voltage during pulse-off period in pulsed magnetron sputtering on afterglow plasma and deposited film structure von Nakano, Takeo, Hirukawa, Norihiko, Saeki, Shuhei, Baba, Shigeru

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Modification of film structure by plasma potential control using triode high power pulsed magnetron sputtering von Nakano, Takeo, Umahashi, Takuya, Baba, Shigeru

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Effect of the target bias voltage during off-pulse period on the impulse magnetron sputtering von Nakano, Takeo, Murata, Chieko, Baba, Shigeru

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Oxygen Incorporation in Reactive-Sputter-Deposited TiN Films: Influence of the Metal to O2 Gas Flux Ratio von NAKANO, Takeo, SEKIYA, Takaaki, BABA, Shigeru

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Effects of Atomic Weight, Gas Pressure, and Target-to-substrate Distance on Deposition Rates in the Sputter Deposition Process von NAKANO, Takeo, YAMAZAKI, Ryo, BABA, Shigeru

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Effect of background gas environment on oxygen incorporation in TiN films deposited using UHV reactive magnetron sputtering von Nakano, Takeo, Hoshi, Ken'ichiroh, Baba, Shigeru

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Growth of Target Race Track Profile during Magnetron Sputtering von NAKANO, Takeo, SAITOU, Yudai, UEDA, Mariko, ITAMURA, Noriaki, BABA, Shigeru

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Gas pressure effects on thickness uniformity and circumvented deposition during sputter deposition process von Nakano, Takeo, Baba, Shigeru

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Transition of Roughness Evolution in Cu–In Alloy Films by the Formation of Intermetallic Compounds von Nakano, Takeo, Mizuhashi, Hiroshi, Baba, Shigeru

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Measurement of surface roughness and ion-induced secondary electron emission coefficient of MgO films prepared by high-pressure sputter deposition von Nakano, Takeo, Fujimoto, Takashi, Baba, Shigeru

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Computed tomography imaging of optical emission from copper-sputter deposition plasma: evaluation of the atomic density using the self-absorption effect von Nakano, Takeo, Tanaka, Kouji, Baba, Shigeru

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Precise determination of the refractive index of sputtered MgO thin films in the visible light range von Baba, Shigeru, Mori, Isao, Nakano, Takeo

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Unambiguous detection of the adhesive failure of metal films in the microscratch test by waveform analysis of the friction signal von Baba, Shigeru, Midorikawa, Tsukasa, Nakano, Takeo

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Alloying and electrical properties of evaporated Cu-In bilayer thin films von NAKANO, T, SUZUKI, T, OHNUKI, N, BABA, S

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The effect of ‘warm’ gas scattering on the deceleration of energetic atoms: Monte Carlo study of the sputter-deposition of compounds von Nakano, Takeo, Mori, Isao, Baba, Shigeru

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Simulation of particle transport in high pressure sputtering von Nakano, Takeo, Baba, Shigeru

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Adhesional Property of PVD Coatings von BABA, Shigeru

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Oxygen Incorporation in Reactive-Sputter-Deposited TiN Films: Influence of the Metal to O sub(2) Gas Flux Ratio von Nakano, Takeo, Sekiya, Takaaki, Baba, Shigeru

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Adhesional Property of PVD Coatings: Factors and Promotion von BABA, Shigeru

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