Anisotropic plasma etching of Silicon in gas chopping process by alternating steps of oxidation and etching von Miakonkikh, A.V., Averkin, S.N., Rudenko, K.V.

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Formation of micro- and nanostructures with well-rounded profile by new e-beam lithography principle von Bruk, M.A., Zhikharev, E.N., Rogozhin, A.E., Streltsov, D.R., Kalnov, V.A., Averkin, S.N., Spirin, A.V.

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SURFACE-ACOUSTIC-WAVE REJECTION FILTER von BAGDASARJAN A.S, AVERKIN S.V, KONDRAT'EV S.N, SEMENOV V.V, BAGDASARJAN N.A

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