Atomic Layer Deposition of High-k Dielectric Layers on Ge and III-V MOS Channels von Delabie, Annelies, Alian, A., Bellenger, Florence, Brammertz, Guy, Brunco, David P., Caymax, Matty, Conard, Thierry, Franquet, A., Houssa, Michel, Sioncke, Sonja, Van Elshocht, S., Van Hemmen, J. L., Keuning, W., Kessels, W. M., Avanasiev, Valery, Stesmans, Andre, Heyns, Marc M., Meuris, Marc

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Atomic Layer Deposition of High-k Dielectric Layers on Ge and III-V MOS Channels von Delabie, Annelies, Caymax, Matty, Bellenger, Florence, Brammertz, Guy, Conard, Thierry, Houssa, Michel, Sioncke, Sonja, Van Elshocht, S., Heyns, Marc M., Meuris, Marc, Brunco, David P., Van Hemmen, J. L., Keuning, W., Kessels, W. M., Avanasiev, Valery, Stesmans, Andre

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