Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates von Sucheewa, Nguentra, Wongwiriyapan, Winadda, Klamchuen, Annop, Obata, Michiko, Fujishige, Masatsugu, Takeuchi, Kenji, Lertvanithphol, Tossaporn, Wutikhun, Tuksadon, Kullyakool, Saifon, Auttasiri, Wanwalee, Sowasod, Nataporn, Prataen, Theerayut, Tanthapanichakoon, Wiwut, Nukeaw, Jiti

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