Characterization of the optical properties of PECVD SiNx films using ellipsometry and reflectometry von Asinovsky, L, Shen, F, Yamaguchi, T

Volltext

Optimization of the polycrystalline silicon-on-silicon dioxide characterization using spectroscopic ellipsometry von Asinovsky, L.M.

Volltext

Characterization of the optical properties of PECVD SiN sub(x) films using ellipsometry and reflectometry von Asinovsky, L, Shen, F, Yamaguchi, T

Volltext

Characterization of the optical properties of PECVD SiN x films using ellipsometry and reflectometry von Asinovsky, L, Shen, F, Yamaguchi, T

Volltext

Characterization of PVD TiN uniformity von Asinovsky, Leo, Frisa, Larry E.

Volltext

Control of PVD TiN thickness measurements von Asinovsky, Leo, Frisa, Larry E.

Volltext

Characterization of PVD tin uniformity von ASINOVSKY, L, FRISA, L. E

Volltext

Spectroellipsometric characterization of thin silicon nitride films von Jiang, Zhong-Tao, Yamaguchi, Tomuo, Aoyama, Mitsuru, Nakanishi, Yoichiro, Asinovsky, Leo

Volltext

Characterization and metrology of the diffusion doped polysilicon using ellipsometry von Asinovsky, Leo, Schroth, Michael, Shen, Fei, Sweeney, John J.

Volltext

The Application of Silicon Rich Nitride Films for Use as Deep-Ultraviolet Lithography Phase-Shifting Masks von Jiang, Zhong-Tao, Yamaguchi, Tomuo, Ohshimo, Kentaro, Aoyama, Mitsuru, Asinovsky, Leo

Volltext

Characterization of the optical properties of PECVD SiNx films using ellipsometry and reflectometry von ASINOVSKY, L, SHEN, F, YAMAGUCHI, T

Volltext

Characterization and metrology of the diffusion doped polysilicon using ellipsometry von ASINOVSKY, L, SCHROTH, M, FEI SHEN, SWEENEY, J. J

Volltext

Characterization of Low Pressure Chemical Vapor Deposited Polysilicon Using Ellipsometry von Asinovsky, L., Schroth, M., Fox, S., Sweeney, J.J., Karagiannis, E.

Volltext

Spectroellipsometric characterization of thin silicon nitride films von JIANG, Z.-T, YAMAGUCHI, T, AOYAMA, M, NAKANISHI, Y, ASINOVSKY, L

Volltext