Transient response of dielectric materials exposed to ultrafast laser radiation von Winkler, S.W., Burakov, I.M., Stoian, R., Bulgakova, N.M., Husakou, A., Mermillod-Blondin, A., Rosenfeld, A., Ashkenasi, D., Hertel, I.V.

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Surface charging and impulsive ion ejection during ultrashort pulsed laser ablation von Stoian, R, Rosenfeld, A, Ashkenasi, D, Hertel, I V, Bulgakova, N M, Campbell, E E B

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Ultrashort-laser-pulse damage threshold of transparent materials and the role of incubation von Rosenfeld, A., Lorenz, M., Stoian, R., Ashkenasi, D.

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Direct-write patterning of indium-tin-oxide film by high pulse repetition frequency femtosecond laser ablation von Choi, H W, Farson, D F, Bovatsek, J, Arai, A, Ashkenasi, D

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Surface damage threshold and structuring of dielectrics using femtosecond laser pulses: the role of incubation von Ashkenasi, D, Lorenz, M, Stoian, R, Rosenfeld, A

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Picosecond Laser Induced Selective Removal of Functional Layers on CIGS Thin Film Solar Cells von Lemke, A., Ashkenasi, D., Eichler, H.J.

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Laser processing of sapphire with picosecond and sub-picosecond pulses von Ashkenasi, D, Rosenfeld, A, Varel, H, Wähmer, M, Campbell, E.E.B

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Fundamentals and advantages of ultrafast micro-structuring of transparent materials von Ashkenasi, D., Müller, G., Rosenfeld, A., Stoian, R., Hertel, I.V., Bulgakova, N.M., Campbell, E.E.B.

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Micromachining of quartz with ultrashort laser pulses von VAREL, H, ASHKENASI, D, ROSENFELD, A, WÄHMER, M, CAMPBELL, E. E. B

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Single and multiple ultrashort laser pulse ablation threshold of Al2O3 (corundum) at different etch phases von Ashkenasi, D., Stoian, R., Rosenfeld, A.

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Application of self-focusing of ps laser pulses for three-dimensional microstructuring of transparent materials von Ashkenasi, D., Varel, H., Rosenfeld, A., Henz, S., Herrmann, J., Cambell, E. E. B.

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Femtosecond laser ablation of sapphire: time-of-flight analysis of ablation plume von Varel, H., Wähmer, M., Rosenfeld, A., Ashkenasi, D., Campbell, E.E.B.

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Ion time-of-flight analysis of ultrashort pulsed laser-induced processing of Al2O3 von STOIAN, R, VAREL, H, ROSENFELD, A, ASHKENASI, D, KELLY, R, CAMPBELL, E. E. B

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Laser-induced damage in SiO2 and CaF2 with picosecond and femtosecond laser pulses von VAREL, H, ASHKENASI, D, ROSENFELD, A, HERRMANN, R, NOACK, F, CAMPBELL, E. E. B

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Time resolved detection of particle removal from dielectrics on femtosecond laser ablation von Rosenfeld, A, Ashkenasi, D, Varel, H, Wähmer, M, Campbell, E.E.B

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Ultra-Short-Pulse Laser Irradiation and Ablation of Dielectrics von Rosenfeld, A., Ashkenasi, D., Campbell, E.E.B.

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Pulse-width influence on laser structuring of dielectrics von Ashkenasi, D., Varel, H., Rosenfeld, A., Noack, F., Campbell, E.E.B

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The dynamics of ion expulsion in ultrashort pulse laser sputtering of Al2O3 von Stoian, R., Ashkenasi, D., Rosenfeld, A., Wittmann, M., Kelly, R., Campbell, E.E.B.

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Monitoring of Focus Position During Laser Processing based on Plasma Emission von Diego-Vallejo, D., Ashkenasi, D., Eichler, H.J.

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Pulse-width influence on the laser-induced structuring of CaF2 (111) von ASHKENASI, D, VAREL, H, ROSENFELD, A, NOACK, F, CAMPBELL, E. E. B

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