Thin-Film Deposition With Refractory Materials Using a Vacuum Arc von Beilis, Isak I., Koulik, Yosef, Yankelevich, Yefim, Arbilly, David, Boxman, Raymond L.

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Thin film deposition using a plasma source with a hot refractory anode vacuum arc von Beilis, Isak I., Koulik, Yosef, Boxman, Raymond L., Arbilly, David

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Filtered vacuum arc deposition of semiconductor thin films von Boxman, R.L., Goldsmith, S., Ben-Shalom, A., Kaplan, L., Arbilly, D., Gidalevich, E., Zhitomirsky, V., Ishaya, A., Keidar, M., Beilis, I.I.

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