The Digital Twin Opportunity von Apte, Pushkar P, Spanos, Costas J

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How Human-Informed AI Leads to More Accurate Digital Twins von Apte, Pushkar P, Spanos, Costas J

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Automatic synthesis of equipment recipes from specified wafer-state transitions von Davis, J.C., Mozumder, P.K., Burch, R., Fernando, C., Apte, P.P., Saxena, S., Rao, S., Vasanth, K.

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Correlation of trap generation to charge-to-breakdown (Q/sub bd/): a physical-damage model of dielectric breakdown von Apte, P.P., Saraswat, K.C.

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SiO2 degradation with charge injection polarity von APTE, P. P, SARASWAT, K. C

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Use of a TiN cap to attain low sheet resistance for scaled TiSi sub(2) on sub-half-micrometer polysilicon lines von Apte, Pushkar P, Paranjpe, Ajit, Pollack, Gordon

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Constant current stress breakdown in ultrathin SiO2 films von APTE, P. P, KUBOTA, T, SARASWAT, K. C

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Charge trap generation in LPCVD oxides under high field stressing von Bhat, N., Apte, P.P., Saraswat, K.C.

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Use of a TiN cap to attain low sheet resistance for scaled TiSi2 on sub-half-micrometer polysilicon lines von Apte, P.P., Paranjpe, A., Pollack, G.

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Rapid thermal processing uniformity using multivariable control of a circularly symmetric 3 zone lamp von Apte, P.P., Saraswat, K.C.

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A model-based approach for process design and its application to the titanium salicide process von Apte, P.P., Saxena, S., Rao, S., Prinslow, D.A., Kittl, J.A., Pollack, G.P.

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Rapid thermal multiprocessing for a programmable factory for adaptable manufacturing of ICs von Saraswat, K.C., Apte, P.P., Booth, L., Yunzhong Chen, Dankoski, P.C.P., Degertekin, F.L., Franklin, G.F., Khuri-Yakub, B.T., Moslehi, M.M., Schaper, C., Gyugyi, P.J., Lee, Y.J., Pei, J., Wood, S.C.

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Use of a capping layer to attain low titanium-silicide sheet resistance and uniform silicide thickness for sub-micron silicon and polysilicon lines von PARANJPE, AJIT P, APTE, PUSHKAR P

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Modeling ultrathin dielectric breakdown on correlation of charge trap-generation to charge-to-breakdown von Apte, P.P., Saraswat, K.C.

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System and method for non-parametric modeling of processed induced variability von RAO SURAJ, APTE PUSHKAR P, FERNANDO CHENJING L, VASANTH KARTHIK, SAXENA SHARAD, DAVIS JOSEPH CARL, MOZUMDER PURNENDU K, BURCH RICHARD GENE

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An integrated approach for accurate simulation and modeling of the silicide-source/drain structure and the silicide-diffusion contact resistance von Apte, P.P., Potla, S., Prinslow, D.A., Pollack, G., Scott, D., Varahramyan, K.

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Wire EDM Characteristics of Biomedical Alloy AISI 316L von Pawade, Amey, Mariyil, Justin, Ilanko, Lakshmi, Mahale, Pushkar, Pawade, Raju

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A thickness model for the TiSi2/TiN stack in the titanium salicide process module von JIUNN-YANN TSAI, PUSHKAR APTE

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Adaptive Fuzzy Watermarking for 3D Models von Motwani, M., Beke, N., Bhoite, A., Apte, P., Harris, F.C.

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The Recession's Silver Lining von Apte, P., Scalise, G.

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