Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries von Penta, Naresh K., Amanapu, H.P., Peethala, B.C., Babu, S.V.

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Role of hydrogen bonding on the adsorption of several amino acids on SiO2 and Si3N4 and selective polishing of these materials using ceria dispersions von Penta, Naresh K., Peethala, B.C., Amanapu, H.P., Melman, A., Babu, S.V.

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