Improved CMOS field isolation using germanium/boron implantation von Pfiester, J.R., Alvis, J.R.

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Gain-enhanced LDD NMOS device using cesium implantation von Pfiester, J.R., Alvis, J.R., Gunderson, C.D.

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A novel 0.5- mu m n/sup +/-p/sup +/ poly-gated salicide CMOS process von Pfiester, J.R., Yeargain, J.R., Swenson, M.S., Alvis, J.R.

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A novel CMOS VLSI isolation technology using selective chlorine implantation von Pfiester, J.R., Alvis, J.R.

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Re-emergence of Chapare hemorrhagic fever in Bolivia, 2019 von Cossaboom, C., Medina Ramirez, A., Romero, C., Morales-Betoulle, M., de la Vega, G.A., Gutiérrez, J.T.M., Loayza Mafayle, R., Ardaya, J.C.A., Martínez, S.S., Zambrana, M.C., Colque, E.G., Aguilera, G.A., Guzmán, J.R., Alvis, F.L.M., Aguilera, C.E.A., Mendez-Rico, J., Whitmer, S., Patel, K., Klena, J., Choi, M., Shoemaker, T., Nichol, S., Spiropoulou, C., Montgomery, J.

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Vacuum electron acceleration by coherent dipole radiation von Troha, A L, Van Meter, J R, Landahl, E C, Alvis, R M, Unterberg, Z A, Li, K, Luhmann, Jr, N C, Kerman, A K, Hartemann, F V

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