A systems approach to 1-µm NMOS von Lepselter, M.P., Alles, D.S., Levinstein, H.J., Smith, G.E., Watson, H.A.

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EBES: A practical electron lithographic system von Herriott, D.R., Collier, R.J., Alles, D.S., Stafford, J.W.

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COMMANDE DE MISE AU POINT AUTOMATIQUE POUR APPAREIL PHOTOGRAPHIQUE von B.E. NEVIS, D.S. ALLES, J.W. ELEK, W.A. SCHLEGEL

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α from the non-perturbatively renormalised lattice three-gluon vertex von Allés, B., Henty, D.S., Panagopoulos, H., Parrinello, C., Pittori, C., Richards, D.G.

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αs from the non-perturbatively renormalised lattice three-gluon vertex von Allés, B., Henty, D.S., Panagopoulos, H., Parrinello, C., Pittori, C., Richards, D.G.

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ANALYSIS OF EXISTING TEST PIECES FOR TESTING OF SENSITIVITY OF FLAW DETECTION MATERIALS DURING PENETRANT TESTING (review) von Golovkov, A.N., Kulichkova, S.I., Kudinov, I.I., Skorobogatko, D.S.

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