Electronic structure and charge transport in nonstoichiometric tantalum oxide von Perevalov, T V, Gritsenko, V A, Gismatulin, A A, Voronkovskii, V A, Gerasimova, A K, Aliev, V Sh, Prosvirin, I A

Volltext

Current oscillations as a manifestation of spatio-temporal inhomogeneity of temperature distribution in vanadium dioxide films at semiconductor-metal phase transition von Aliev, V. Sh, Bortnikov, S. G., Mzhelskiy, I. V., Badmaeva, I. A.

Volltext

Resistive Switching Effect in TaN/HfOx/Ni Memristors with a Filament Formed under Local Electron-Beam Crystallization von Voronkovskii, V. A., Gerasimova, A. K., Aliev, V. Sh

Volltext

VO2 film temperature dynamics at low-frequency current self-oscillations von Bortnikov, S. G., Aliev, V. Sh, Badmaeva, I. A., Mzhelskiy, I. V.

Volltext

Forming-Free Memristors Based on Hafnium Oxide Processed in Electron Cyclotron Resonance Hydrogen Plasma von Perevalov, T. V., Iskhakzai, R. M. Kh, Prosvirin, I. P., Aliev, V. Sh, Gritsenko, V. A.

Volltext

The origin of 2.7 eV luminescence and 5.2 eV excitation band in hafnium oxide von Perevalov, T. V., Aliev, V. Sh, Gritsenko, V. A., Saraev, A. A., Kaichev, V. V., Ivanova, E. V., Zamoryanskaya, M. V.

Volltext

Anomalous large electrical capacitance of planar microstructures with vanadium dioxide films near the insulator-metal phase transition von Aliev, V. Sh, Bortnikov, S. G., Badmaeva, I. A.

Volltext

Atomic and Electronic Structure of SiOx Films Obtained with Hydrogen Electron Cyclotron Resonance Plasma von Perevalov, T. V., Iskhakzai, R. M. Kh, Aliev, V. Sh, Gritsenko, V. A., Prosvirin, I. P.

Volltext

Investigations of stochastic resonance in two-terminal device with vanadium dioxide film von Aliev, V. Sh, Bortnikov, S. G., Badmaeva, I. A.

Volltext

Charge Transport in Nonstoichiometric SiOx Obtained by Treatment of Thermal SiO2 in Hydrogen Plasma of Electronic-Cyclotron Resonance von Iskhakzay, R. M. Kh, Kruchinin, V. N., Aliev, V. Sh, Gritsenko, V. A., Dementieva, E. V., Zamoryanskaya, M. V.

Volltext

Optical Properties of the SiOx (x < 2) Thin Films Obtained by Hydrogen Plasma Processing of Thermal Silicon Dioxide von Kruchinin, V. N., Perevalov, T. V., Aliev, V. Sh, Iskhakzai, R. M. Kh, Spesivtsev, E. V., Gritsenko, V. A., Pustovarov, V. A.

Volltext

Lead phthalocyanine films deposited by ECR plasma-induced sublimation von Aliev, V Sh, Badmaeva, I A, Pokrovsky, L D

Volltext

Comparative study of electron-beam crystallization of amorphous hafnium oxides HfO2 and HfOx (x = 1.82) von Gerasimova, A. K., Aliev, V. Sh, Krivyakin, G. K., Voronkovskii, V. A.

Volltext

Optical properties of HfOx (x < 2) films grown by ion beam sputtering-deposition method von Gerasimova, A K, Aliev, V Sh, Kruchinin, V N, Badmaeva, I A, Voronkovskii, V A, Bortnikov, S G

Volltext

Optical properties of nonstoichiometric ZrO x according to spectroellipsometry data von Kruchinin, V. N., Aliev, V. Sh, Gerasimova, A. K., Gritsenko, V. A.

Volltext

Synchrotron-Excited Luminescence and Converting of Defects and Quantum Dots in Modified Silica Films von Pustovarov, V.A., Zatsepin, A.F., Biryukov, D.Yu, Aliev, V.Sh, Iskhakzay, R.M.Kh, Gritsenko, V.A.

Volltext

Resistive Switching Effect in TaN/HfOx/Ni Memristors with a Filament Formed under Local Electron-Beam Crystallization von Voronkovskiy, V. A, Gerasimova, A. K, Aliev, V. Sh

Volltext

Phonon-assisted electron tunneling between traps in silicon oxide films treated in hydrogen plasma von Voronkovskii, V.A., Perevalov, T.V., Iskhakzay, R.M.H., Aliev, V.Sh, Gritsenko, V.A., Prosvirin, I.P.

Volltext

Electronic structure of oxygen vacancies in hafnium oxide von Perevalov, T.V., Aliev, V.Sh, Gritsenko, V.A., Saraev, A.A., Kaichev, V.V.

Volltext

Atomic and Electronic Structure of SiO.sub.x Films Obtained with Hydrogen Electron Cyclotron Resonance Plasma von Perevalov, T. V, Iskhakzai, R. M. Kh, Aliev, V. Sh, Gritsenko, V. A, Prosvirin, I. P

Volltext