Surface characteristics of etched parylene-C films for low-damaged patterning process using inductively-coupled O2/CHF3 gas plasma von Ham, Yong-Hyun, Shutov, Dmitriy Alexandrovich, Kwon, Kwang-Ho

Volltext

Surface characteristics of parylene-C films in an inductively coupled O2/CF4 gas plasma von Ham, Yong-Hyun, Shutov, Dmitriy Alexandrovich, Baek, Kyu-Ha, Do, Lee-Mi, Kim, Kwangsoo, Lee, Chi-Woo, Kwon, Kwang-Ho

Volltext

Study on surface modification of silicon using CHF 3 /O 2 plasma for nano-imprint lithography von Kim, Youngkeun, Kang, Sungchil, Ham, Yong-Hyun, Kwon, Kwang-Ho, Alexandrovich Shutov, Dmitriy, Lee, Hyun-Woo, Jong Lee, Jae, Do, Lee-Mi, Baek, Kyu-Ha

Volltext

Study on surface modification of silicon using CHF3/O2 plasma for nano-imprint lithographya von Kim, Youngkeun, Kang, Sungchil, Ham, Yong-Hyun, Kwon, Kwang-Ho, Alexandrovich Shutov, Dmitriy, Lee, Hyun-Woo, Jong Lee, Jae, Do, Lee-Mi, Baek, Kyu-Ha

Volltext

Study on surface modification of silicon using CHF3/O2 plasma for nano-imprint lithography von Kim, Youngkeun, Kang, Sungchil, Ham, Yong-Hyun, Kwon, Kwang-Ho, Alexandrovich Shutov, Dmitriy, Lee, Hyun-Woo, Jong Lee, Jae, Do, Lee-Mi, Baek, Kyu-Ha

Volltext

Surface characteristics of parylene-C films in an inductively coupled O 2/CF 4 gas plasma von Ham, Yong-Hyun, Shutov, Dmitriy Alexandrovich, Baek, Kyu-Ha, Do, Lee-Mi, Kim, Kwangsoo, Lee, Chi-Woo, Kwon, Kwang-Ho

Volltext

Kinetics of Chemical Changes in Phenol Formaldehyde Based Polymeric Films Etched in N 2 O and O 2 Inductively Coupled Plasmas: A Comparative Study von Kwon, Kwang-Ho, Min, Nam-Ki, Kang, Seung-Youl, Baek, Kyu-Ha, Suh, Kyung Soo, Shutov, Dmitriy Alexandrovich

Volltext

Surface characteristics of parylene-C films in an inductively coupled O2/CF4 gas plasma von HAM, Yong-Hyun, ALEXANDROVICH SHUTOV, Dmitriy, BAEK, Kyu-Ha, DO, Lee-Mi, KIM, Kwangsoo, LEE, Chi-Woo, KWON, Kwang-Ho

Volltext