Tuning of oxygen vacancy-induced electrical conductivity in Ti-doped hematite films and its impact on photoelectrochemical water splitting von Biswas, Pranab, Ainabayev, Ardak, Zhussupbekova, Ainur, Jose, Feljin, O’Connor, Robert, Kaisha, Aitkazy, Walls, Brian, Shvets, Igor V.

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High-performance p-type V2O3 films by spray pyrolysis for transparent conducting oxide applications von Ainabayev, Ardak, Walls, Brian, Mullarkey, Daragh, Caffrey, David, Fleischer, Karsten, Smith, Christopher M., McGlinchey, Amy, Casey, Daniel, McCormack, Sarah J., Shvets, Igor

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Tailoring Epitaxial VO 2 Thin Films with Tunable Properties via Spray Pyrolysis von Ainabayev, Ardak, Walls, Brian, Casey, Daniel, Caffrey, David, Mullarkey, Daragh, McGlinchey, Amy, Khare, Amit, Tikhonov, Alexander, Ilhan, Cansu, Brennan, Darragh, McCormack, Sarah J., Shvets, Igor

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Epitaxial Grown VO2 with Suppressed Hysteresis and Low Room Temperature Resistivity for High-Performance Thermal Sensor Applications von Ainabayev, Ardak, Mullarkey, Daragh, Walls, Brian, Caffrey, David, Zhussupbekov, Kuanysh, Zhussupbekova, Ainur, Ilhan, Cansu, Kaisha, Aitkazy, Biswas, Pranab, Tikhonov, Alexander, Murtagh, Oisin, Shvets, Igor

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Growth of ZnO:Al by atomic layer deposition: Deconvoluting the contribution of hydrogen interstitials and crystallographic texture on the conductivity von Mauit, Ozhet, Caffrey, David, Ainabayev, Ardak, Kaisha, Aitkazy, Toktarbaiuly, Olzat, Sugurbekov, Yerzhigit, Sugurbekova, Gulnar, Shvets, Igor V., Fleischer, Karsten

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High-performance p-type V 2 O 3 films by spray pyrolysis for transparent conducting oxide applications von Ainabayev, Ardak, Walls, Brian, Mullarkey, Daragh, Caffrey, David, Fleischer, Karsten, Smith, Christopher M, McGlinchey, Amy, Casey, Daniel, McCormack, Sarah J, Shvets, Igor

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Epitaxial Grown VO 2 with Suppressed Hysteresis and Low Room Temperature Resistivity for High-Performance Thermal Sensor Applications von Ainabayev, Ardak, Mullarkey, Daragh, Walls, Brian, Caffrey, David, Zhussupbekov, Kuanysh, Zhussupbekova, Ainur, Ilhan, Cansu, Kaisha, Aitkazy, Biswas, Pranab, Tikhonov, Alexander, Murtagh, Oisin, Shvets, Igor

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Atomic layer deposition for TiO2 and TiN nanometer films von Insepov, Zeke, Ainabayev, Ardak, Bozheyev, Farabi, Zhuldassov, Abat, Lukasheva, Maria, Tynyshtykbaev, Kurbangali B.

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