Effect of low temperature oxidation on dielectric properties of mercury sensitized photo-deposited silicon nitride films von Sahu, B.S., Srivastava, P., Agnihotri, O.P., Shivaprasad, S.M.

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Study of thermally grown and photo-CVD deposited silicon oxide–silicon nitride stack layers von Sahu, B S, Kapoor, A, Srivastava, P, Agnihotri, O P, Shivaprasad, S M

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Plasma induced type conversion in mercury cadmium telluride von Agnihotri, O P, Lee, Hee Chul, Yang, Keedong

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Dependence of hydrogen and oxygen incorporation on deposition parameters in photochemical vapor deposited mercury free silicon nitride films von Sahu, B.S, Srivastava, P, Agnihotri, O.P, Lee, H.C, Sekhar, B.R, Mahapatra, S, Tiwari, M.K

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Advances in low temperature processing of silicon nitride based dielectrics and their applications in surface passivation and integrated optical devices von Agnihotri, O P, Jain, S C, Poortmans, J, Szlufcik, J, Beaucarne, G, Nijs, J, Mertens, R

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Bake stability of CdTe and ZnS on HgCdTe: An X-ray photoelectron spectroscopy study von JHA, S. K, SRIVASTAVA, P, PAL, R, ANJALI, SEHGAL, H. K, HEE CHUL LEE, AGNIHOTRI, O. P, GONG, B. B

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Current status and issues in the surface passivation technology of mercury cadmium telluride infrared detectors von Agnihotri, O P, Musca, C A, Faraone, L

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Influence of hydrogen on losses in silicon oxynitride planar optical waveguides von Sahu, B S, Agnihotri, O P, Jain, S C, Mertens, R, Kato, Isamo

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Role of incorporated hydrogen in non-stoichiometric photo-deposited silicon nitride films von Sahu, B.S, Srivastava, P, Sehgal, H.K, Agnihotri, O.P

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Study of interface traps from transient photoconductive decay measurements in passivated HgCdTe von PAL, R, GOPAL, V, CHAUDHURY, P. K, SHARMA, B. L, BASU, P. K, AGNIHOTRI, O. P, KUMAR, V

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ULTRAVIOLET PHOTON INDUCED BULK, SURFACE AND INTERFACE MODIFICATIONS IN n-Hg0.8Cd0.2Te IN HYDROGEN ENVIRONMENT von Agnihotri, O P, Pal, R, Yang, K, Bae, S-H, Lee, S-J, Lee, M-Y

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Photoluminescence from Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films Fabricated by Double-Tubed-Coaxial-Line-Type Microwave Plasma Chemical Vapor Deposition Syst... von Kato, Isamu, Matsumoto, Takayuki, Agnihotri, O. P.

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The preparation, properties and applications of silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition von Gupta, Manju, Rathi, V.K., Thangaraj, R., Agnihotri, O.P., Chari, K.S.

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Analysis of the effect of surface passivant charges on HgCdTe photoconductive detectors von Pal, R, Bhan, R K, Chhabra, K C, Agnihotri, O P

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Effect of HgCdTe–passivant interface properties on the responsivity performance of photoconductive detectors von Pal, R., Sharma, B.L., Gopal, V., Kumar, V., Agnihotri, O.P.

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Photo-processing of silicon nitride von Rathi, V.K., Gupta, Manju, Thangaraj, R., Chari, K.S., Agnihotri, O.P.

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Silicon oxynitride films deposited by mercury photosensitization chemical vapour deposition von VIPAN KUMAR, CHARI, K. S, AGNIHOTRI, O. P

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Silicon oxynitride waveguides for optoelectronic integrated circuits von AGNIHOTRI, O. P, TYAGI, R, KATO, I

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Optical and solar selective properties of chemically sprayed copper sulphide films von Gadgil, S B, Thangaraj, R, Agnihotri, O P

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Optical properties of H2S-annealed CuInSe2 films von AREN, G, VANKAR, V. D, AGNIHOTRI, O. P, CHATAR SINGH

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