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    The Characterization of KrF Photoresists and the Effect of Different Ultraviolet (UV) Absorption Rates on Line Edge Roughness (LER) for Submicron Technology

    The Characterization of KrF Photoresists and the Effect of Different Ultraviolet (UV) Absorption Rates on Line Edge Roughness (LER) for Submicron Technology von bin Mohd Bakri, A.Y., Manaf, M.J., Abdul Wahab, K.I., Bin Ahmad, M.I.


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