Deposition of TaAl-N Thin Film with Ta-Al Composite Target by Reactive Sputtering von OKANO, Yukiko, TAJIRI, Shuichi, AOZONO, Takashi, OKAMOTO, Akio, OGAWA, Soichi, MIMA, Hiroshi

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Deposition of TaAl-N Thin Film with Ta-Al Composite Target by Reactive Sputtering von OKANO, Yukiko, TAJIRI, Shuichi, AOZONO, Takashi, OKAMOTO, Akio, OGAWA, Soichi, MIMA, Hiroshi

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TaAl-N Thin Film Prepared by Radio Frequency and Direct Current Reactive Sputtering von OKANO, Yukiko, TAJIRI, Shuichi, AOZONO, Takashi, OKAMOTO, Akio, OGAWA, Soichi, MIMA, Hiroshi

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Ta-Al 複合ターゲットを用いた反応性スパッタ法による窒化物薄膜の形成 von 岡野, 夕紀子, 田尻, 修一, 青園, 隆司, 岡本, 昭夫, 小川, 倉一, 美馬, 宏司

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HEAT-CONDUCTING MOISTURE METER von AOZONO TAKASHI, OKANO YUKIKO, MIMA KOJI, OGAWA SOICHI, TAJIRI SHUICHI

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MICRO PRESSURE SENSOR von AOZONO TAKASHI, OKANO YUKIKO, MIMA KOJI, OGAWA SOICHI, OKAMOTO AKIO, TAJIRI SHUICHI

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VACUUM ENVIRONMENT MEASUREMENT CONTROL SYSTEM von AOZONO TAKASHI, OKANO YUKIKO, MIMA KOJI, OGAWA SOICHI, OKAMOTO AKIO, TAJIRI SHUICHI

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Fabrication of High TCR TaAl-N Thin Film by Reactive Sputtering Method von OKANO, Yukiko, TAJIRI, Shuichi, AOZONO, Takashi, OKAMOTO, Akio, OGAWA, Soichi, MIMA, Hiroshi

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Deposition of TaAl-N Thin Film on the Polyimide Film —Discussion for the New Vacuum Sensor in a Wide Range von OKANO, Yukiko, TAJIRI, Shuichi, AOZONO, Takashi, OKAMOTO, Akio, OGAWA, Soichi, MIMA, Hiroshi

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PRESSURE SENSOR AND VACUUM PROCESSING APPARATUS USING PRESSURE SENSOR von TAJIRI, SHUICHI, AOZONO, TAKASHI, OGAWA, SOICHI, MIMA, HIROSHI, OKANO, YUKIKO

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MATERIAL FOR THERMISTOR, AND METHOD FOR MANUFACTURING THE SAME von AOZONO TAKASHI, MIMA KOJI, OGAWA SOICHI, OKAMOTO AKIO, TAJIRI SHUICHI

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反応性スパッタ法により作製した TaAl-N 薄膜の抵抗温度係数の窒素分圧依存性 von 岡野, 夕紀子, 田尻, 修一, 青園, 隆司, 岡本, 昭夫, 小川, 倉一, 美馬, 宏司

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ポリイミドフィルムへの TaAl-N 薄膜の形成 ～広領域真空センサ応用への可能性の検討 von 岡野, 夕紀子, 田尻, 修一, 青園, 隆司, 岡本, 昭夫, 小川, 倉一, 美馬, 宏司

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