Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS) von Anders, André

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A structure zone diagram including plasma-based deposition and ion etching von Anders, André

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A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) von Anders, André

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Discharge physics of high power impulse magnetron sputtering von Anders, André

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Building on excellence and reputation, a more inclusive Journal of Applied Physics evolves von Anders, André

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Plasma potential of a moving ionization zone in DC magnetron sputtering von Panjan, Matjaž, Anders, André

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Localized heating of electrons in ionization zones: Going beyond the Penning-Thornton paradigm in magnetron sputtering von Anders, André

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Meeting today’s needs in applied physics publishing von Anders, André

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Glows, arcs, ohmic discharges: An electrode-centered review on discharge modes and the transitions between them von Anders, André

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Self-organization and self-limitation in high power impulse magnetron sputtering von Anders, André

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Serving a scientific community in an evolving research landscape von Anders, André

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Deposition rates of high power impulse magnetron sputtering: Physics and economics von Anders, André

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Foundations of physical vapor deposition with plasma assistance von Gudmundsson, Jon Tomas, Anders, André, von Keudell, Achim

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Direct observation of spoke evolution in magnetron sputtering von Anders, André, Yang, Yuchen

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Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering von Anders, André, Ni, Pavel, Rauch, Albert

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High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering von Anders, André, Andersson, Joakim, Ehiasarian, Arutiun

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Plasma studies of a linear magnetron operating in the range from DC to HiPIMS von Anders, André, Yang, Yuchen

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Self-sputtering runaway in high power impulse magnetron sputtering:The role of secondary electrons and multiply charged metal ions von Anders, André

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High power impulse magnetron sputtering and related discharges: Scalable plasma sources for plasma-based ion implantation and deposition von Anders, André

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The evolution of ion charge states in cathodic vacuum arc plasmas: a review von Anders, André

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