Improvement of ionization yield in sputtered neutral mass spectrometry using pulsed infrared and ultraviolet lasers von Saito, Reiko, Akutsu, Haruko, Asakawa, Jun, Zhao, Yue, Kiyokawa, Kei, Morita, Masato, Sakamoto, Tetsuo, Fujii, Masaaki

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Matrix and element dependences of useful yield in Si and SiO2 matrices using laser-ionization sputtered neutral mass spectrometry von Saito, Reiko, Akutsu, Haruko, Asakawa, Jun, Takeno, Shiro, Kiyokawa, Kei, Nagashima, Satoru, Ishikawa, Takeharu, Kashiwagi, Takahiro, Takano, Akio, Sakamoto, Tetsuo, Fujii, Masaaki

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Distribution of trace impurities in microvolumes and analysis of concentration using laser sputtered neutral mass spectrometry von Akutsu, Haruko, Saito, Reiko, Asakawa, Jun, Kiyokawa, Kei, Morita, Masato, Sakamoto, Tetsuo, Fujii, Masaaki

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Mechanism of Contact Resistance Reduction in Nickel Silicide Films by Pt Incorporation von Sonehara, T., Hokazono, A., Akutsu, H., Sasaki, T., Uchida, H., Tomita, M., Kawanaka, S., Inaba, S., Toyoshima, Y.

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A rice cytochrome P450 OsCYP84A that may interact with the UV tolerance pathway von Sasaki, T., Tokyo Univ. of Science, Noda, Chiba (Japan). Faculty of Science and Technology, Akutsu, H, Shimada, H, Miura, S

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Study on the Improvement of the 2nd Generation SNMS Using Femto-second Laser von Saito, Reiko, Akutsu, Haruko, Morita, Masato, akamoto, Tetsuo

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Study on the Improvement of the 2nd Generation SNMS Using Femto-second Laser von Saito, Reiko, Akutsu, Haruko, Morita, Masato, Sakamoto, Tetsuo

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10–15 nm Ultrashallow Junction Formation by Flash-Lamp Annealing von Ito, Takayuki, Iinuma, Toshihiko, Murakoshi, Atsushi, Akutsu, Haruko, Suguro, Kyoichi, Arikado, Tsunetoshi, Okumura, Katsuya, Yoshioka, Masaki, Owada, Tatsushi, Imaoka, Yasuhiro, Murayama, Hiromi, Kusuda, Tatsuhumi

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Depth profile analysis of helium in silicon with high-resolution elastic recoil detection analysis von Tomita, Mitsuhiro, Akutsu, Haruko, Oshima, Yasunori, Sato, Nobutaka, Mure, Shoichi, Fukuyama, Hirofumi, Ichihara, Chikara

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ELECTRON MICROSCOPE AND CRYSTAL EVALUATION METHOD von OTSUKA, Yuki, AKUTSU, Haruko, HOSHINO, Ken

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MASS SPECTROMETER von OTSUKA, Yuki, AKUTSU, Haruko, ASAKAWA, Jun

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フェムト秒レーザーを用いた“第2世代”レーザーSNMSの高感度化の検討 von 齋藤, 玲子, 圷, 晴子, 森田, 真人, 坂本, 哲夫

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Ionization of sputtered particles and its angular distribution von Yorisaki, Toma, Saito, Reiko, Akutsu, Haruko

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Mass spectrometer performing mass spectrometry for sample with laser irradiation von Yorisaki, Toma, Akutsu, Haruko

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Material inspection apparatus and material inspection method von AKUTSU HARUKO

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MASS SPECTROSCOPE AND MASS SPECTROMETRY von AKUTSU HARUKO

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Contact resistance reduction of Pt-incorporated NiSi for continuous CMOS scaling ∼ Atomic level analysis of Pt/B/As distribution within silicide films von Sonehara, T., Hokazono, A., Akutsu, H., Sasaki, T., Uchida, H., Tomita, M., Tsujii, H., Kawanaka, S., Inaba, S., Toyoshima, Y.

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MATERIAL INSPECTION APPARATUS AND MATERIAL INSPECTION METHOD von AKUTSU HARUKO

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MATERIAL INSPECTION APPARATUS von AKUTSU HARUKO

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Sample analyzing apparatus and sample analyzing method von AKUTSU HARUKO

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