Measurements of the intrinsic stress in thin metal films von Abermann, R.

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Evolution of internal stress and microstructure in Ti50Cu50 alloy films: influence of substrate temperature and composition von Bertel, St, Abermann, R.

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Influence of substrate properties on the growth of titanium films: part IV von Oberhauser, P, Abermann, R

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Influence of substrate properties on the growth of titanium films: part III von Oberhauser, P., Abermann, R.

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Internal stress of vapour-deposited aluminium films : effect of O2 and water vapour present during film deposition von ABERMANN, R

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Internal stress of vapour-deposited aluminium films: Effect of O 2 and water vapour present during film deposition von Abermann, R.

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Internal stress and structure of ultrahigh vacuum evaporated chromium and iron films and their dependence on substrate temperature and oxygen partial pressure during deposition von Thurner, G., Abermann, R.

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The internal stress in thin silver, copper and gold films von Abermann, R., Koch, R.

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Internal stress of vapour-deposited aluminium on aluminium substrate films: Effect of O 2 and water incorporated in the substrate von Abermann, R.

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Influence of substrate properties on the growth of titanium films : Part II von POPPELLER, M, ABERMANN, R

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Influence of substrate properties on the growth of titanium films: Part II von Poppeller, M., Abermann, R.

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A UHV‐compatible thin‐film stress‐measuring apparatus based on the cantilever beam principle von Koch, R., Leonhard, H., Thurner, G., Abermann, R.

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In situ study of thin film growth by internal stress measurement under ultrahigh vacuum conditions: Silver and copper under the influence of oxygen von Abermann, R., Koch, R.

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Microstructural changes in vapour-deposited silver, copper and gold films investigated by internal stress measurements von Koch, R., Abermann, R.

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On the influence of the substrate properties on the internal growth stress of titanium films at 250 °C von Schneeweiß, H.J., Abermann, R.

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Influence of substrate properties on the growth of titanium films. Part I von Poppeller, M., Abermann, R.

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On the influence of thermal effects on internal stress measurements during and after deposition of silver, gold and copper films von Koch, R., Abermann, R.

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On the mechanical properties of uhv-deposited Cr films and their dependence on substrate temperature, oxygen pressure and substrate material von Thurner, G., Abermann, R.

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Influence of substrate properties on the growth of titanium films:: Part II von Poppeller, M, Abermann, R

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Ultra-high vacuum measurements of the internal stress of PVD titanium films as a function of thickness and its dependence on substrate temperature von Schneeweiβ, HJ, Abermann, R

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