Reversible Gelation of II-VI Nanocrystals: The Nature of Interparticle Bonding and the Origin of Nanocrystal Photochemical Instability von Pala, Irina R, Arachchige, Indika U, Georgiev, Daniel G, Brock, Stephanie L

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An ab initio computational study of pure Zn3N2 and its native point defects and dopants Cu, Ag and Au von Jiang, Nanke, Roehl, Jason L., Khare, Sanjay V., Georgiev, Daniel G., Jayatissa, Ahalapitiya H.

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Stable stoichiometric copper nitride thin films via reactive sputtering von Islam, Md Maidul, Georgiev, Daniel G.

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Substrate Integrated Waveguide Bandpass Filtering with Fourier-varying Via-hole Walling von Hussein, Osama I., Shamaileh, Khair A. Al, Dib, Nihad I., Nosrati, Amir, Abushamleh, Said, Georgiev, Daniel G., Devabhakuni, Vijay K.

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Copper tantalum nitride (CuTaN2) thin films prepared by reactive radio-frequency magnetron sputtering von Islam, Md Maidul, Ranga, Abhishek Goud, Borra, Vamsi, Georgiev, Daniel G.

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Tin Whisker Growth Suppression Using NiO Sublayers Fabricated by Dip Coating von Buchanan, Jacob D., Borra, Vamsi, Islam, Md Maidul, Georgiev, Daniel G., Itapu, Srikanth

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Negative Differential Resistance (NDR) Behavior of Nickel Oxide (NiO) Based Metal-Insulator-Semiconductor Structures von Khan, Kamruzzaman, Itapu, Srikanth, Georgiev, Daniel G.

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Sn whisker growth mitigation by using NiO sublayers von Borra, Vamsi, Itapu, Srikanth, Georgiev, Daniel G

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Laser-Based Fabrication of Microstructures on Nickel Thin Films and Its Applications in On-Chip Thin Film Inductors von Itapu, Srikanth, Borra, Vamsi, Georgiev, Daniel G.

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Characterization of iridium oxide thin films deposited by pulsed-direct-current reactive sputtering von Thanawala, Sachin, Georgiev, Daniel G., Baird, Ronald J., Auner, Gregory

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Amorphous and crystalline IrO2 thin films as potential stimulation electrode coatings von THANAWALA, Sachin S, BAIRD, Ronald J, GEORGIEV, Daniel G, AUNER, Gregory W

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Hybrid Edge Termination in Vertical GaN: Approximating Beveled Edge Termination via Discrete Implantations von Nelson, Tolen, Pandey, Prakash, Georgiev, Daniel G., Hontz, Michael R., Koehler, Andrew D., Hobart, Karl D., Anderson, Travis J., Ildefonso, Adrian, Khanna, Raghav

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Examination of Trapping Effects on Single-Event Transients in GaN HEMTs von Nelson, Tolen, Georgiev, Daniel G., Hontz, Michael R., Khanna, Raghav, Ildefonso, Adrian, Koehler, Andrew D., Hobart, Karl, Khachatrian, Ani, McMorrow, Dale

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The statistics of tin whisker diameters versus the underlying film grains von Oudat, Osama A, Borra, Vamsi, Georgiev, Daniel G, Karpov, Victor G

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Hybrid Edge Termination for High-Voltage Vertical GaN Devices: Empirical Validation and Robust Processing Tolerance von Pandey, Prakash, Nelson, Tolen M., Hontz, Michael R., Georgiev, Daniel G., Khanna, Raghav, Jacobs, Alan G., Lundh, James S., Gallagher, James C., Koehler, Andrew D., Hobart, Karl D., Anderson, Travis J.

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Experimental Validation of Robust Hybrid Edge Termination Structures in Vertical GaN p-i-n Diodes With Avalanche Capability von Lundh, James Spencer, Jacobs, Alan G., Pandey, Prakash, Nelson, Tolen, Georgiev, Daniel G., Koehler, Andrew D., Khanna, Raghav, Tadjer, Marko J., Hobart, Karl D., Anderson, Travis J.

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A Simple Edge Termination Design for Vertical GaN P-N Diodes von Pandey, Prakash, Nelson, Tolen M., Collings, William M., Hontz, Michael R., Georgiev, Daniel G., Koehler, Andrew D., Anderson, Travis J., Gallagher, James C., Foster, Geoffrey M., Jacobs, Alan, Ebrish, Mona A., Gunning, Brendan P., Kaplar, Robert J., Hobart, Karl D., Khanna, Raghav

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Modification of reactively sputtered NiOx thin films by pulsed UV laser irradiation von Itapu, Srikanth, Georgiev, Daniel G., Uprety, Prakash, Podraza, Nikolas J.

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Whisker growth on Sn thin film accelerated under gamma-ray induced electric field von Killefer, Morgan, Borra, Vamsi, Al-Bayati, Ahmed, Georgiev, Daniel G, Karpov, Victor G, Ishmael Parsai, E, Shvydka, Diana

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Post-Deposition Annealing Effects on Ferromagnetic CoFeB Thin Films von O'Dell, Ryan A., Phillips, Adam B., Georgiev, Daniel G., Jones, John G., Brown, Gail J., Heben, Michael J.

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