Influence of Defects on Top of the Absorber in Extreme Ultraviolet Lithography von Kim, Eun-Jin, Kang, Young-Min, Oh, Hye-Keun, Park, In-Ho, Lee, Jung-Youl, Kim, Deog-Bae, Kim, Jae-Hyun

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Bulk Effects of Thermal Flow Resists von sang-kon kim, 오혜근(HANYANG, Cheol-Kyu Bok, 안일신, Seung-Chan Moon, Sung-Muk Lee

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Process Extension Techniques for Optical Lithography: Thermal Treatment, Polarization and Double Patterning von sang-kon kim, 오혜근(Hanyang

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A Study of Process Parameter Control for Nanopattern von Sang-Kon Kim(HANYANG, 오혜근(HANYANG

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Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths von Hye-Young Kang(HANYANG, 오혜근(HANYANG, Chang-Ho Lee, Sung-Hyuck Kim

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Improvement of Column Spacer Uniformity in a TFT LCD Panel von Jung-Hyuk Cho, 오혜근(HANYANG, Jong-Sun Kim(HANYANG, Jung-Min Sohn, Sung-Hyuck Kim, Young-Hoon Kim(HANYANG

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Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks von Jung-Hyuk Cho, 오혜근(HANYANG, Jin-Back Park(HANYANG, Jong-Sun Kim(HANYANG, Jung-Min Sohn, Sung-Hyuck Kim, Sung-Jin Kim(HANYANG

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Simulation Parameter Extraction Using Distribution Processing and Fast SEM Profile Digitization von Jun-Taek Park(HANYANG, 오혜근(HANYANG, Dong-Soo Sohn(HANYANG

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Resist Pattern Collapse Modeling for Smaller Features von 형주 이(HANYANG, 오혜근(HANYANG, Ilsin An(HANYANG, Ji-Yong Yoo(HANYANG, Jun-Taek Park(HANYANG

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A Practical Method of Extracting the Photoresist Exposure Parameters by Using a Dose-to-Clear Swing Curve von 형희 김(HANYANG, 오혜근(HANYANG, Ilsin An(HANYANG, Ji-Yong Yoo(HANYANG, Seung -Wook Park(HANYANG, Young-Keun Kwon(HANYANG

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Lens Aberration Effect on the Line Width for Different Pattern Shapes and Duty Ratios von Ji-Eun Lee(HANYANG, Seung-Wook Park(HANYANG, Chang-Ho Lee, 오혜근, 안일신

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Reduction in the Mask Error Factor by Optimizing the Diffraction Order of a Scattering Bar in Lithography von Mi-Ae Ha(HANYANG, 오혜근

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Line-Width Variation with Absorber Thickness in Extreme Ultraviolet Lithography von Young-Doo JEON(HANYANG, 오혜근, 안일신, Jong-Sun KIM(HANYANG

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Calibration-Free Multichannel Ellipsometry for Retardance Measurement von 안일신, 오혜근, J. . Kyung(HANYANG, K. Y. Bang(HANYANG, 김옥경, R. W. Collin

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