Effect of capacitive coupling in a miniature inductively coupled plasma source von Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

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Surface roughening and rippling during plasma etching of silicon: Numerical investigations and a comparison with experiments von Tsuda, Hirotaka, Nakazaki, Nobuya, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

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Surface smoothing during plasma etching of Si in Cl2 von Nakazaki, Nobuya, Matsumoto, Haruka, Tsuda, Hirotaka, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

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A miniature electrothermal thruster using microwave-excited microplasmas: Thrust measurement and its comparison with numerical analysis von Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

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Microwave-excited microplasma thruster with helium and hydrogen propellants von Takahashi, Takeshi, Takao, Yoshinori, Ichida, Yugo, Eriguchi, Koji, Ono, Kouichi

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Numerical and experimental study of microwave-excited microplasma and micronozzle flow for a microplasma thruster von Takahashi, Takeshi, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

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Microplasma thruster for ultra-small satellites: Plasma chemical and aerodynamical aspects von Takao, Yoshinori, Takahashi, Takeshi, Eriguchi, Koji, Ono, Kouichi

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Particle Simulations of Sheath Dynamics in Low-Pressure Capacitively Coupled Argon Plasma Discharges von Takao, Yoshinori, Matsuoka, Kenji, Eriguchi, Koji, Ono, Kouichi

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Cu配線Layoutに依存した新たなLow-kプラズマダメージモデル von 池田, 太郎, 江利口, 浩二, 谷原, 聡, 山本, 伸彦, 河西, 繁, 斧, 髙一

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マイクロ波加熱によるシリコン表面近傍のプラズマ誘起欠陥修復 von 岩井, 隆晃, 江利口, 浩二, 山内, 祥平, 野呂, 尚孝, 北川, 淳一, 斧, 髙一

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Molecular dynamics simulations of Si etching in Cl- and Br-based plasmas: Cl+ and Br+ ion incidence in the presence of Cl and Br neutrals von Nakazaki, Nobuya, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

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Microwave-sustained miniature plasmas for an ultra small thruster von Takao, Yoshinori, Ono, Kouichi, Takahashi, Kazuo, Setsuhara, Yuichi

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Two modes of surface roughening during plasma etching of silicon: Role of ionized etch products von Nakazaki, Nobuya, Tsuda, Hirotaka, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

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Classical interatomic potential model for Si/H/Br systems and its application to atomistic Si etching simulation by HBr von Nagaoka, T., Eriguchi, K., Ono, K., Ohta, H.

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An interatomic potential model for molecular dynamics simulation of silicon etching by Br+-containing plasmas von Ohta, H., Iwakawa, A., Eriguchi, K., Ono, K.

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プラズマナノ加工における表面ラフネスとリップル形成機構 von 斧, 高一, 津田, 博隆, 中崎, 暢也, 鷹尾, 祥典, 江利口, 浩二

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プラズマエッチングにおける表面形状進展 von 斧, 高一

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半導体プラズマプロセスシミュレーションと TCAD von 斧, 高一

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「プラズマエレクトロニクス分科内招待講演」プラズマ微細加工プロセスのモデリングと体系化：シリコンからメタル・高誘電体材料まで... von 斧, 高一

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「プラズマエレクトロニクス賞受賞記念講演」高誘電率 (High-k) 材料のドライエッチング von 斧, 高一

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